Textile and Apparel: Pattern I
First Term: 2012 Summer II Final Term: Current
Total Credits: 13
CIPS Code: 52.1802
|Initiating College: Mesa Community College|
Program Availability: College Specific
Occupational Area: Art, A/V Technology, and Communication/Merchandising
Instructional Council: Family and Consumer Sciences (34)
Detailed Program Information
The Certificate of Completion (CCL) in Textile and Apparel: Pattern I program is designed for students with an interest in design and development of flat patterns for custom and commercial apparel. It provides students with skills using the proper techniques in pattern drafting, grading and CAD applications for apparel patterns. Completers of the certificate will enter the fashion industry at entry-level positions but with an understanding of the pattern drafting industry.Program Notes:
Students must earn a grade of "C" or better for all courses within the program.
+ indicates courses has prerequisites and/or corequisites.
++ indicates any module/suffixed courses.
| ||Credits: 0-3|
| ||TEC111||Clothing Construction (3) OR|| |
| ||TEC125||Fashion Design (3) OR|| |
| ||Permission of Program Director||0-3|
| ||Credits: 15|
|+||TEC221||Computer-Assisted Fashion Design||3|
|+||TEC225||Pattern Design I||3|
|+||TEC226||Draping for Fashion Design||3|
|1.|| Develop portfolio for computer-assisted apparel designs using industry software and the elements and principles of design. (TEC221)|
|2.||Apply flat pattern techniques in creating original designs, patterns, and garments. (TEC225)|
|3.||Drape, mark, and true an original design in a knit fabric. (TEC226)|
|4.||Grade Patterns to change sizes. (TEC231)|
|5.||Design and construct an original garment for a line/collection. (TEC270)|
All information published is subject to change without notice. Every effort has been made to ensure the accuracy of information presented, but based on the dynamic nature of the curricular process, course and program information is subject to change in order to reflect the most current information available.