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Center for Curriculum and Transfer Articulation
Textile and Apparel: Pattern II
Major: 5765
First Term: 2012 Summer II    Final Term: Current
Award: CCL
Total Credits: 11
CIPS Code: 52.1802
Initiating College: Mesa Community College
Program Availability: College Specific
Occupational Area: Art, A/V Technology, and Communication/Merchandising
Instructional Council: Family and Consumer Sciences (34)
GPA: 2.00

Detailed Program Information


Description: The Certificate of Completion (CCL) in Textile and Apparel: Pattern II program is designed for students with an interest in design and development of flat patterns for custom and commercial apparel. It provides students with advanced skills using the proper techniques in pattern drafting, grading and CAD applications for apparel patterns. Completers of the certificate will enter the fashion industry at entry-level positions or above with skills and an understanding of the pattern drafting industry.

Program Notes:
Students must earn a grade of "C" or better for all courses within the program.
+ indicates course has prerequisites and/or corequisites.
++ indicates any module/suffixed courses.


Program Prerequisites
 Credits: 0-13
+Certificate of Completion in Textile and Apparel: Pattern I (5764) (13) OR
permission of Program Director0-13
 
Required Courses
 Credits: 11
+TEC224Pattern Drafting2
+TEC228Advanced Draping for Fashion Design3
+TEC230Pattern Design II3
+TEC233Computer-Assisted Pattern Making3
 

Program Competencies
 
1. Draft patterns using measurements from dress forms and human figures. (TEC224)
2.Drape and construct an original design. (TEC228)
3.Design patterns using flat pattern method. (TEC230)
4.Create pattern using appropriate hardware and software. (TEC233)
 


All information published is subject to change without notice. Every effort has been made to ensure the accuracy of information presented, but based on the dynamic nature of the curricular process, course and program information is subject to change in order to reflect the most current information available.